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Published on: February 25, 2017
Ultralow-Threshold Lasing in a Nanobeam Cavity Using Topological Interface State
Xiqing Chen1, Hancong Li1, Zhikai Ma1
1State Key Laboratory for Mesoscopic Physics and Frontiers Science Center for Nano-optoelectronics, School of Physics, Peking University, Beijing100871, China.
Abstract:
Achieving ultralow-threshold topological lasing remains an important challenge for integrated photonics. We report an ultralow-threshold nanolaser based on a topological Su-Schrieffer-Heeger (SSH) nanobeam interface state with embedded semiconductor quantum dots. By removing the central hole at the SSH interface, the topological cavity mode is preserved, while the quality factor is improved and the small mode volume is maintained. The optimized field profile also enhances cavity-gain coupling, increasing the high-field fraction inside the semiconductor by ∼20%. Experimentally, optimized-interface nanobeam devices exhibit single-mode continuous-wave lasing with a threshold of approximately 640 nW. Under pulsed excitation, single-mode lasing is also observed with a peak incident pump threshold of approximately 62 μW. Power-dependent photon-correlation measurements reveal pronounced near-threshold bunching followed by gradual suppression at higher pump powers, indicating delayed coherence buildup above the threshold.

