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Volatile ZrO2 Antiferroelectric Tunnel Junctions for Rapid, Energy-Efficient Physical Reservoir Computing
Taegyu Kwon1, Moonseek Jeong1, Su In Hwang2
1Department of Materials Science and Engineering & Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul, Republic of Korea.
Abstract:
Physical reservoir computing requires nonlinear response, fading memory, and rich transient state diversity, yet conventional nonvolatile memories often rely on explicit reset operations or long relaxation times. ZrO2-based two-terminal antiferroelectric tunnel junctions (AFTJs) exploit the field-induced tetragonal-to-orthorhombic transition and spontaneous back-switching of antiferroelectric ZrO2. This intrinsic self-relaxation provides reset-free fading memory in the sub-ms regime. An amorphous In-Ga-Zn oxide interlayer enlarges the dynamic range, and stoichiometric control identifies the 2:2:1-ZrO2 AFTJ as the optimal composition, delivering an Ion/Ioff of ∼890, a peak nonlinearity factor of ∼48.4, and a paired-pulse facilitation index of 1.79. The enhanced memory margin and nonlinear dynamics support 16 transient current states and yield 90.4% accuracy in Modified National Institute of Standards and Technology classification with a fourfold reduction in spatiotemporal dimensionality. Temporal information processing is further assessed using an experimentally calibrated circuit-level reservoir model, enabling waveform classification, one-step-ahead Hénon-map prediction (normalized root-mean-square error [NRMSE] = 0.01489), and forecasting of a noisy real-world semiconductor index time series (NRMSE = 0.12263). The fabricated 40 000 µm2 AFTJ shows a unit latency of ∼2 µs and energy consumption below 480 pJ per operation. Analytical area scaling projects show that a 100 µm2 device could achieve ∼192 ns latency and ∼115 fJ per operation.
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