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A J M Mackus

Showing results (1-10 of 6) with videos related to

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The Journal of Physical Chemistry. C, Nanomaterials and Interfaces|February 18, 2022
Surface Chemistry during Atomic Layer Deposition of Pt Studied with Vibrational Sum-Frequency GenerationV Vandalon, A J M Mackus, W M M Kessels
Nanoscale|August 27, 2014
The use of atomic layer deposition in advanced nanopatterningA J M Mackus, A A Bol, W M M Kessels
ACS Applied Materials & Interfaces|October 5, 2018
Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O<sub>2</sub> PlasmaA Mameli, M A Verheijen, A J M Mackus, et al.
Nanoscale|July 5, 2012
Nanopatterning by direct-write atomic layer depositionA J M Mackus, S A F Dielissen, J J L Mulders, et al.
The Journal of Physical Chemistry Letters|July 16, 2024
The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition ProcessesI Tezsevin, J H Deijkers, M J M Merkx, et al.
Langmuir : the ACS Journal of Surfaces and Colloids|March 15, 2023
Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule InhibitorI Tezsevin, J F W Maas, M J M Merkx, et al.
Pageof 1

Showing results (1-10 of 6) with videos related to

Sort By:
Pageof 1
The Journal of Physical Chemistry. C, Nanomaterials and Interfaces|February 18, 2022
Surface Chemistry during Atomic Layer Deposition of Pt Studied with Vibrational Sum-Frequency GenerationV Vandalon, A J M Mackus, W M M Kessels
Nanoscale|August 27, 2014
The use of atomic layer deposition in advanced nanopatterningA J M Mackus, A A Bol, W M M Kessels
ACS Applied Materials & Interfaces|October 5, 2018
Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O<sub>2</sub> PlasmaA Mameli, M A Verheijen, A J M Mackus, et al.
Nanoscale|July 5, 2012
Nanopatterning by direct-write atomic layer depositionA J M Mackus, S A F Dielissen, J J L Mulders, et al.
The Journal of Physical Chemistry Letters|July 16, 2024
The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition ProcessesI Tezsevin, J H Deijkers, M J M Merkx, et al.
Langmuir : the ACS Journal of Surfaces and Colloids|March 15, 2023
Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule InhibitorI Tezsevin, J F W Maas, M J M Merkx, et al.
Pageof 1