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Journal of Synchrotron Radiation|March 12, 2019
The U125 insertion device beamline at the Metrology Light SourceAlexander Gottwald, Hendrik Kaser, Michael KolbeApplied Optics|October 20, 2017
Uncertainty analysis for the determination of B<sub>4</sub>C optical constants by angle-dependent reflectance measurement for 40 nm to 80 nm wavelengthAlexander Gottwald, Karl Wiese, Udo Kroth, et al.Applied Optics|November 22, 2018
Optical properties of a Cr/4H-SiC photodetector in the spectral range from ultraviolet to extreme ultravioletAlexander Gottwald, Udo Kroth, Evgenia Kalinina, et al.Applied Optics|May 6, 2006
Absolute measurement of F2-laser power at 157 nmStefan Kück, Friedhelm Brandt, Hans-Albert Kremling, et al.Applied Optics|December 13, 2002
Metrology of pulsed radiation for 157-nm lithographyMathias Richter, Udo Kroth, Alexander Gottwald, et al.Nanotechnology|July 2, 2016
Irradiation-induced degradation of PTB7 investigated by valence band and S 2p photoelectron spectroscopyErik Darlatt, Burhan Muhsin, Roland Roesch, et al.Journal of Synchrotron Radiation|July 6, 2019
An X-ray gas monitor for free-electron lasersAndrey A Sorokin, Yilmaz Bican, Susanne Bonfigt, et al.Applied Optics|November 13, 2007
Polarization-dependent vacuum-ultraviolet reflectometry using elliptically polarized synchrotron radiationAlexander Gottwald, Françoise Bridou, Mireille Cuniot-Ponsard, et al.Beilstein Journal of Nanotechnology|October 21, 2020
Controlling the electronic and physical coupling on dielectric thin filmsPhilipp Hurdax, Michael Hollerer, Larissa Egger, et al.Nature Communications|July 20, 2019
Identifying surface reaction intermediates with photoemission tomographyXiaosheng Yang, Larissa Egger, Philipp Hurdax, et al.Pageof 2