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Journal of Micro/Nanolithography, MEMS, and MOEMS : JM3
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October 31, 2024
Evaluating the Effects of Modeling Errors for Isolated Finite 3D Targets
Mark-Alexander Henn, Bryan M Barnes, Hui Zhou
OSA Continuum
|
December 12, 2019
Data-driven approaches to optical patterned defect detection
Mark-Alexander Henn, Hui Zhou, Bryan M Barnes
Optik
|
March 6, 2018
Design of angle-resolved illumination optics using nonimaging bi-telecentricity for 193 nm scatterfield microscopy
Martin Y Sohn, Bryan M Barnes, Richard M Silver
Applied Optics
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September 5, 2012
Improving optical measurement uncertainty with combined multitool metrology using a Bayesian approach
Nien Fan Zhang, Richard M Silver, Hui Zhou, et al.
Applied Optics
|
October 3, 2013
Fourier domain optical tool normalization for quantitative parametric image reconstruction
Jing Qin, Richard M Silver, Bryan M Barnes, et al.
Optics Letters
|
November 3, 2016
Optimizing the nanoscale quantitative optical imaging of subfield scattering targets
Mark-Alexander Henn, Bryan M Barnes, Hui Zhou, et al.
Measurement Science & Technology
|
October 31, 2024
Combining model-based measurement results of critical dimensions from multiple tools
Nien Fan Zhang, Bryan M Barnes, Hui Zhou, et al.
Light, Science & Applications
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March 1, 2016
Deep-subwavelength Nanometric Image Reconstruction using Fourier Domain Optical Normalization
Jing Qin, Richard M Silver, Bryan M Barnes, et al.
Applied Optics
|
June 21, 2007
Scatterfield microscopy for extending the limits of image-based optical metrology
Richard M Silver, Bryan M Barnes, Ravikiran Attota, et al.
Optics Express
|
November 13, 2013
Three-dimensional deep sub-wavelength defect detection using λ = 193 nm optical microscopy
Bryan M Barnes, Martin Y Sohn, Francois Goasmat, et al.
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of 2
Search research articles
Search
Showing results (1-10 of 11) with videos related to
Sort By:
Page
of 2
Journal of Micro/Nanolithography, MEMS, and MOEMS : JM3
|
October 31, 2024
Evaluating the Effects of Modeling Errors for Isolated Finite 3D Targets
Mark-Alexander Henn, Bryan M Barnes, Hui Zhou
OSA Continuum
|
December 12, 2019
Data-driven approaches to optical patterned defect detection
Mark-Alexander Henn, Hui Zhou, Bryan M Barnes
Optik
|
March 6, 2018
Design of angle-resolved illumination optics using nonimaging bi-telecentricity for 193 nm scatterfield microscopy
Martin Y Sohn, Bryan M Barnes, Richard M Silver
Applied Optics
|
September 5, 2012
Improving optical measurement uncertainty with combined multitool metrology using a Bayesian approach
Nien Fan Zhang, Richard M Silver, Hui Zhou, et al.
Applied Optics
|
October 3, 2013
Fourier domain optical tool normalization for quantitative parametric image reconstruction
Jing Qin, Richard M Silver, Bryan M Barnes, et al.
Optics Letters
|
November 3, 2016
Optimizing the nanoscale quantitative optical imaging of subfield scattering targets
Mark-Alexander Henn, Bryan M Barnes, Hui Zhou, et al.
Measurement Science & Technology
|
October 31, 2024
Combining model-based measurement results of critical dimensions from multiple tools
Nien Fan Zhang, Bryan M Barnes, Hui Zhou, et al.
Light, Science & Applications
|
March 1, 2016
Deep-subwavelength Nanometric Image Reconstruction using Fourier Domain Optical Normalization
Jing Qin, Richard M Silver, Bryan M Barnes, et al.
Applied Optics
|
June 21, 2007
Scatterfield microscopy for extending the limits of image-based optical metrology
Richard M Silver, Bryan M Barnes, Ravikiran Attota, et al.
Optics Express
|
November 13, 2013
Three-dimensional deep sub-wavelength defect detection using λ = 193 nm optical microscopy
Bryan M Barnes, Martin Y Sohn, Francois Goasmat, et al.
Page
of 2