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Chemical Society Reviews|April 13, 2013
Covalent adaptable networks: smart, reconfigurable and responsive network systemsChristopher J Kloxin, Christopher N Bowman
Macromolecules|February 18, 2010
Stress relaxation via addition-fragmentation chain transfer in a thiol-ene photopolymerizationChristopher J Kloxin, Timothy F Scott, Christopher N Bowman
Chemical Communications (Cambridge, England)|April 11, 2013
A new photoclick reaction strategy: photo-induced catalysis of the thiol-Michael addition via a caged primary amineWeixian Xi, Matthias Krieger, Christopher J Kloxin, et al.
ACS Macro Letters|May 24, 2022
Nitrogen-Centered Nucleophile Catalyzed Thiol-Vinylsulfone Addition, Another Thiol-ene "Click" ReactionWeixian Xi, Chen Wang, Christopher J Kloxin, et al.
Advanced Materials (Deerfield Beach, Fla.)|May 18, 2010
Mechanical properties of cellularly responsive hydrogels and their experimental determinationApril M Kloxin, Christopher J Kloxin, Christopher N Bowman, et al.
Dental Materials : Official Publication of the Academy of Dental Materials|July 27, 2010
Covalent adaptable networks as dental restorative resins: stress relaxation by addition-fragmentation chain transfer in allyl sulfide-containing resinsHee Young Park, Christopher J Kloxin, Timothy F Scott, et al.
Macromolecules|November 20, 2012
Stress Reduction and T(g) Enhancement in Ternary Thiol-Yne-Methacrylate Systems via Addition-fragmentation Chain TransferHee Young Park, Christopher J Kloxin, Mark F Fordney, et al.
Macromolecules|March 23, 2010
Covalent Adaptable Networks (CANs): A Unique Paradigm in Crosslinked PolymersChristopher J Kloxin, Timothy F Scott, Brian J Adzima, et al.
Macromolecules|September 28, 2011
Stress Relaxation by Addition-Fragmentation Chain Transfer in Highly Crosslinked Thiol-Yne NetworksHee Young Park, Christopher J Kloxin, Timothy F Scott, et al.
Dental Materials : Official Publication of the Academy of Dental Materials|May 22, 2012
Stress relaxation of trithiocarbonate-dimethacrylate-based dental compositesHee Young Park, Christopher J Kloxin, Mark F Fordney, et al.
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