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Nanotechnology|June 28, 2014
Low-temperature plasma etching of high aspect-ratio densely packed 15 to sub-10 nm silicon features derived from PS-PDMS block copolymer patternsZuwei Liu, Xiaodan Gu, Justin Hwu, et al.
Advanced Materials (Deerfield Beach, Fla.)|June 17, 2015
Resist Materials for Extreme Ultraviolet Lithography: Toward Low-Cost Single-Digit-Nanometer PatterningPaul D Ashby, Deirdre L Olynick, D Frank Ogletree, et al.
Nanoscale|November 30, 2018
Polymer-metal coating for high contrast SEM cross sections at the deep nanoscaleDaniel Staaks, Deirdre L Olynick, Ivo W Rangelow, et al.
Nanotechnology|July 16, 2014
Harnessing entropic and enthalpic contributions to create a negative tone chemically amplified molecular resist for high-resolution lithographyPrashant K Kulshreshtha, Ken Maruyama, Sara Kiani, et al.
Nano Letters|June 15, 2010
Formation of bandgap and subbands in graphene nanomeshes with sub-10 nm ribbon width fabricated via nanoimprint lithographyXiaogan Liang, Yeon-Sik Jung, Shiwei Wu, et al.
Advanced Materials (Deerfield Beach, Fla.)|August 21, 2012
High aspect ratio sub-15 nm silicon trenches from block copolymer templatesXiaodan Gu, Zuwei Liu, Ilja Gunkel, et al.
Nano Letters|December 17, 2008
Electrostatic force assisted exfoliation of prepatterned few-layer graphenes into device sitesXiaogan Liang, Allan S P Chang, Yuegang Zhang, et al.
ACS Nano|April 24, 2010
Nanoimprint-induced molecular stacking and pattern stabilization in a solution-processed subphthalocyanine filmXiaogan Liang, Teresa Chen, Yeon-Sik Jung, et al.
Nanotechnology|September 9, 2016
Low temperature dry etching of chromium towards control at sub-5 nm dimensionsDaniel Staaks, XiaoMin Yang, Kim Y Lee, et al.
Nanotechnology|July 17, 2018
Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide featuresStefano Dallorto, Daniel Staaks, Adam Schwartzberg, et al.
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