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Gonzalo R Arce

Showing results (1-10 of 80) with videos related to

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Optics Express|March 4, 2011
Pixel-based OPC optimization based on conjugate gradientsXu Ma, Gonzalo R Arce
IEEE Transactions on Image Processing : a Publication of the IEEE Signal Processing Society|May 9, 2014
Colored coded aperture design by concentration of measure in compressive spectral imagingHenry Arguello, Gonzalo R Arce
Optics Express|November 26, 2008
PSM design for inverse lithography with partially coherent illuminationXu Ma, Gonzalo R Arce
Journal of the Optical Society of America. A, Optics, Image Science, and Vision|July 2, 2009
Binary mask optimization for forward lithography based on the boundary layer model in coherent systemsXu Ma, Gonzalo R Arce
Optics Express|June 25, 2009
Generalized inverse lithography methods for phase-shifting mask designXu Ma, Gonzalo R Arce
Optics Express|April 1, 2009
Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithographyXu Ma, Gonzalo R Arce
IEEE Transactions on Image Processing : a Publication of the IEEE Signal Processing Society|September 25, 2009
Variable density compressed image samplingZhongmin Wang, Gonzalo R Arce
IEEE Transactions on Image Processing : a Publication of the IEEE Signal Processing Society|October 13, 2012
Rank minimization code aperture design for spectrally selective compressive imagingHenry Arguello, Gonzalo R Arce
Journal of the Optical Society of America. A, Optics, Image Science, and Vision|December 26, 2009
Binary mask optimization for forward lithography based on boundary layer model in coherent systems: erratumXu Ma, Gonzalo R Arce
Journal of the Optical Society of America. A, Optics, Image Science, and Vision|November 4, 2011
Code aperture optimization for spectrally agile compressive imagingHenry Arguello, Gonzalo R Arce
Pageof 8

Showing results (1-10 of 80) with videos related to

Sort By:
Pageof 8
Optics Express|March 4, 2011
Pixel-based OPC optimization based on conjugate gradientsXu Ma, Gonzalo R Arce
IEEE Transactions on Image Processing : a Publication of the IEEE Signal Processing Society|May 9, 2014
Colored coded aperture design by concentration of measure in compressive spectral imagingHenry Arguello, Gonzalo R Arce
Optics Express|November 26, 2008
PSM design for inverse lithography with partially coherent illuminationXu Ma, Gonzalo R Arce
Journal of the Optical Society of America. A, Optics, Image Science, and Vision|July 2, 2009
Binary mask optimization for forward lithography based on the boundary layer model in coherent systemsXu Ma, Gonzalo R Arce
Optics Express|June 25, 2009
Generalized inverse lithography methods for phase-shifting mask designXu Ma, Gonzalo R Arce
Optics Express|April 1, 2009
Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithographyXu Ma, Gonzalo R Arce
IEEE Transactions on Image Processing : a Publication of the IEEE Signal Processing Society|September 25, 2009
Variable density compressed image samplingZhongmin Wang, Gonzalo R Arce
IEEE Transactions on Image Processing : a Publication of the IEEE Signal Processing Society|October 13, 2012
Rank minimization code aperture design for spectrally selective compressive imagingHenry Arguello, Gonzalo R Arce
Journal of the Optical Society of America. A, Optics, Image Science, and Vision|December 26, 2009
Binary mask optimization for forward lithography based on boundary layer model in coherent systems: erratumXu Ma, Gonzalo R Arce
Journal of the Optical Society of America. A, Optics, Image Science, and Vision|November 4, 2011
Code aperture optimization for spectrally agile compressive imagingHenry Arguello, Gonzalo R Arce
Pageof 8