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ACS Applied Materials & Interfaces|September 1, 2023
Area-Selective Atomic Layer Deposition for Resistive Random-Access Memory DevicesIl-Kwon Oh, Asir Intisar Khan, Shengjun Qin, et al.
Nano Letters|September 19, 2019
Gate Quantum Capacitance Effects in Nanoscale TransistorsSujay B Desai, Hossain M Fahad, Theodor Lundberg, et al.
Nano Letters|January 25, 2019
Low-Temperature Side Contact to Carbon Nanotube Transistors: Resistance Distributions Down to 10 nm Contact LengthGregory Pitner, Gage Hills, Juan Pablo Llinas, et al.
ACS Nano|March 23, 2016
Hysteresis in Carbon Nanotube Transistors: Measurement and Analysis of Trap Density, Energy Level, and Spatial DistributionRebecca Sejung Park, Max Marcel Shulaker, Gage Hills, et al.
Nano Letters|January 3, 2019
Spatial Separation of Carrier Spin by the Valley Hall Effect in Monolayer WSe2 TransistorsElyse Barré, Jean Anne C Incorvia, Suk Hyun Kim, et al.
Nanotechnology|October 24, 2013
Experimental study of plane electrode thickness scaling for 3D vertical resistive random access memoryHong-Yu Chen, Shimeng Yu, Bin Gao, et al.
Nature Nanotechnology|April 20, 2021
Electrical tuning of phase-change antennas and metasurfacesYifei Wang, Patrick Landreman, David Schoen, et al.
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