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Optics Express|August 5, 2014
Critical dimension measurement of transparent film layers by multispectral imagingSoonyang Kwon, Namyoon Kim, Taeyong Jo, et al.Optics Express|September 10, 2020
Angle-resolved spectral reflectometry with a digital light processing projectorGaram Choi, Mingyu Kim, Jinyong Kim, et al.Applied Optics|August 12, 2025
Snapshot angle-resolved channeled spectroscopic micro-ellipsometry for thin-film characterizationYoung Joon Kim, Se Jun Lee, Heui Jae PahkOptics Express|April 4, 2015
Residual vibration reduction of white-light scanning interferometry by input shapingJeong Il Mun, Taeyong Jo, Taiwook Kim, et al.Optics Express|September 10, 2020
Co-axial spectroscopic snap-shot ellipsometry for real-time thickness measurements with a small spot sizeSeung Woo Lee, Sin Yong Lee, Garam Choi, et al.Applied Optics|August 5, 2020
Single-shot multispectral angle-resolved ellipsometryGaram Choi, Seung Woo Lee, Sin Yong Lee, et al.Applied Optics|November 22, 2018
Simple method for volumetric thickness measurement using a color cameraGaram Choi, Yoonhyuk Lee, Seung Woo Lee, et al.Applied Optics|November 22, 2021
Single sequence phase shifting spectrally resolved interferometry for an in-line thin film thickness measurement using spectral reflectance and phaseYeongchan Cho, Seung Woo Lee, Sin Yong Lee, et al.Applied Optics|October 6, 2021
Single-sequence stable spectroscopic reflectometry using simultaneous measurement of incident light and reflected lightSin Yong Lee, Seung Woo Lee, Garam Choi, et al.Applied Optics|December 28, 2020
Coaxial spectroscopic imaging ellipsometry for volumetric thickness measurementSeung Woo Lee, Garam Choi, Sin Yong Lee, et al.Pageof 2