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Scientific Reports
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March 31, 2017
Characterization of three-dimensional field distribution of bowtie aperture using quasi-spherical waves and surface plasmon polaritons
Changhoon Park, Howon Jung, Jae W Hahn
Scientific Reports
|
August 31, 2017
Nanoscale 2.5-dimensional surface patterning with plasmonic lithography
Howon Jung, Changhoon Park, Seonghyeon Oh, et al.
Optics Express
|
December 10, 2009
Plasmonic nano lithography with a high scan speed contact probe
Yongwoo Kim, Seok Kim, Howon Jung, et al.
Scanning
|
March 30, 2011
Design of a contact probe with high positioning accuracy for plasmonic lithography
Jinhee Jang, Yongwoo Kim, Seok Kim, et al.
Advanced Materials (Deerfield Beach, Fla.)
|
October 9, 2012
Resolution limit in plasmonic lithography for practical applications beyond 2x-nm half pitch
Seok Kim, Howon Jung, Yongwoo Kim, et al.
Optics Express
|
October 15, 2011
Accurate near-field lithography modeling and quantitative mapping of the near-field distribution of a plasmonic nanoaperture in a metal
Yongwoo Kim, Howon Jung, Seok Kim, et al.
Page
of 1
Search research articles
Search
Showing results (1-10 of 6) with videos related to
Sort By:
Page
of 1
Scientific Reports
|
March 31, 2017
Characterization of three-dimensional field distribution of bowtie aperture using quasi-spherical waves and surface plasmon polaritons
Changhoon Park, Howon Jung, Jae W Hahn
Scientific Reports
|
August 31, 2017
Nanoscale 2.5-dimensional surface patterning with plasmonic lithography
Howon Jung, Changhoon Park, Seonghyeon Oh, et al.
Optics Express
|
December 10, 2009
Plasmonic nano lithography with a high scan speed contact probe
Yongwoo Kim, Seok Kim, Howon Jung, et al.
Scanning
|
March 30, 2011
Design of a contact probe with high positioning accuracy for plasmonic lithography
Jinhee Jang, Yongwoo Kim, Seok Kim, et al.
Advanced Materials (Deerfield Beach, Fla.)
|
October 9, 2012
Resolution limit in plasmonic lithography for practical applications beyond 2x-nm half pitch
Seok Kim, Howon Jung, Yongwoo Kim, et al.
Optics Express
|
October 15, 2011
Accurate near-field lithography modeling and quantitative mapping of the near-field distribution of a plasmonic nanoaperture in a metal
Yongwoo Kim, Howon Jung, Seok Kim, et al.
Page
of 1