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ACS Macro Letters
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July 15, 2024
Si-Containing Reverse-Gradient Block Copolymer for Inorganic Pattern Amplification in EUV Lithography
Yemin Park, Seung Won Song, Jeehyun Hong, et al.
Small (Weinheim an Der Bergstrasse, Germany)
|
December 13, 2025
Versatile Reactive Gradient Block Copolymer System for Highly Robust Nanopatterns With Spontaneous Vertical Orientation
Jeehyun Hong, Yemin Park, Gyu Rac Lee, et al.
Nature Communications
|
March 27, 2026
Deformation- and damage-free transfer of soft electronics onto highly curved and fragile biological surfaces
Kyeong Min Song, Myung-Kun Chung, Jeehoon Jung, et al.
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of 1
Search research articles
Search
Showing results (1-10 of 3) with videos related to
Sort By:
Page
of 1
ACS Macro Letters
|
July 15, 2024
Si-Containing Reverse-Gradient Block Copolymer for Inorganic Pattern Amplification in EUV Lithography
Yemin Park, Seung Won Song, Jeehyun Hong, et al.
Small (Weinheim an Der Bergstrasse, Germany)
|
December 13, 2025
Versatile Reactive Gradient Block Copolymer System for Highly Robust Nanopatterns With Spontaneous Vertical Orientation
Jeehyun Hong, Yemin Park, Gyu Rac Lee, et al.
Nature Communications
|
March 27, 2026
Deformation- and damage-free transfer of soft electronics onto highly curved and fragile biological surfaces
Kyeong Min Song, Myung-Kun Chung, Jeehoon Jung, et al.
Page
of 1