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Scientific Reports|December 12, 2012
Strain evolution of each type of grains in poly-crystalline (Ba,Sr)TiO(3) thin films grown by sputteringWoo Young Park, Min Hyuk Park, Jong Ho Lee, et al.Inorganic Chemistry|March 23, 2017
Germanium Compounds Containing Ge═E Double Bonds (E = S, Se, Te) as Single-Source Precursors for Germanium Chalcogenide MaterialsHyo-Suk Kim, Eun Ae Jung, Seong Ho Han, et al.Small (Weinheim an Der Bergstrasse, Germany)|October 24, 2024
Aluminum-Doped Indium Oxide Electron Transport Layer Grown by Atomic Layer Deposition: Highly Efficient and Damage-Resistant Interconnection Solution for All-Perovskite Tandem Solar Cells with 25.46% EfficiencyPil Ju Youn, Mun Young Woo, Jong Hyeon Won, et al.Chemical Communications (Cambridge, England)|February 27, 2015
Strong hydrophobizer: laterally chemisorbed low-molecular-weight polydimethylsiloxaneSoo Sang Chae, Jin Young Oh, Jee Ho Park, et al.ACS Omega|August 29, 2019
New Heteroleptic Cobalt Precursors for Deposition of Cobalt-Based Thin FilmsSeong Ho Han, Sheby Mary George, Ga Yeon Lee, et al.Dalton Transactions (Cambridge, England : 2003)|July 14, 2015
Heteroleptic strontium complexes stabilized by donor-functionalized alkoxide and β-diketonate ligandsSheby Mary George, Hyo-Suk Kim, Hyun Ji Oh, et al.ACS Applied Materials & Interfaces|April 5, 2019
High-Performance Thin-Film Transistors of Quaternary Indium-Zinc-Tin Oxide Films Grown by Atomic Layer DepositionIn-Hwan Baek, Jung Joon Pyeon, Seong Ho Han, et al.ACS Omega|January 17, 2022
Novel Heteroleptic Tin(II) Complexes Capable of Forming SnO and SnO2 Thin Films Depending on Conditions Using Chemical Solution DepositionSeong Ho Han, Raphael Edem Agbenyeke, Ga Yeon Lee, et al.Advanced Materials (Deerfield Beach, Fla.)|February 7, 2013
Highly improved uniformity in the resistive switching parameters of TiO2 thin films by inserting Ru nanodotsJung Ho Yoon, Jeong Hwan Han, Ji Sim Jung, et al.ACS Applied Materials & Interfaces|September 28, 2016
Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor ApplicationHyo Yeon Kim, Eun Ae Jung, Geumbi Mun, et al.Pageof 3