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Jeun Kee Chua

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Applied Optics|December 15, 2010
Interferometric lithography for nanoscale feature patterning: a comparative analysis between laser interference, evanescent wave interference, and surface plasmon interferenceKandammathe Valiyaveedu Sreekanth, Jeun Kee Chua, Vadakke Matham Murukeshan
Optics Express|September 6, 2008
Nano-scale three dimensional surface relief features using single exposure counterpropagating multiple evanescent waves interference phenomenonVadakke Matham Murukeshan, Jeun Kee Chua, Sia Kim Tan, et al.
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Showing results (1-10 of 2) with videos related to

Sort By:
Pageof 1
Applied Optics|December 15, 2010
Interferometric lithography for nanoscale feature patterning: a comparative analysis between laser interference, evanescent wave interference, and surface plasmon interferenceKandammathe Valiyaveedu Sreekanth, Jeun Kee Chua, Vadakke Matham Murukeshan
Optics Express|September 6, 2008
Nano-scale three dimensional surface relief features using single exposure counterpropagating multiple evanescent waves interference phenomenonVadakke Matham Murukeshan, Jeun Kee Chua, Sia Kim Tan, et al.
Pageof 1