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Optics Express|July 21, 2023
Fast diffraction model of lithography mask based on improved pixel-to-pixel generative adversarial networkJunbi Zhang, Xu MaOptics Express|November 29, 2023
Fast inverse lithography approach based on a model-driven graph convolutional networkShengen Zhang, Xu Ma, Junbi ZhangDigestive Diseases and Sciences|November 25, 2021
Circ_0044556 Promotes the Progression of Colorectal Cancer via the miR-665-Dependent Expression Regulation of Diaphanous Homolog 1Xu Ma, Chong DengApplied Optics|August 12, 2025
Fast lithographic thick-mask model using overlapped patch matchingSheng Liu, Xu MaOptics Letters|March 1, 2022
Off-axis aberration correction for a reflective coded aperture snapshot spectral imagerXianhong Zhao, Xu MaOptics Express|July 30, 2025
Efficient source and mask optimization based on interpretable hypergraph auto-encoding networkShengen Zhang, Xu MaJournal of the Optical Society of America. A, Optics, Image Science, and Vision|November 28, 2008
Binary mask optimization for inverse lithography with partially coherent illuminationXu Ma, Gonzalo ArceJournal of Affective Disorders|September 2, 2024
Using machine learning models to identify the risk of depression in middle-aged and older adults with frequent and infrequent nicotine use: A cross-sectional studyYuran Qiu, Xu MaOptics Express|October 13, 2022
Informatics-based computational lithography for phase-shifting mask optimizationYihua Pan, Xu MaApplied Optics|August 12, 2025
ResGNN-OPC: a fast optical proximity correction approach based on an interpretable residual graph neural networkJingqing Liu, Xu MaPageof 104