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Applied Optics|April 8, 2010
Multiple angle ellipsometric analysis of surface layers and surface layer contaminantsM E Pedinoff, O M StafsuddApplied Optics|March 9, 2010
Strain induced anisotropy in As(2)S(3), As(2)Se(3), and ZnSe films on KCI substrates via 10.6-microm and 0.6328-microm ellipsometer measurements and 0.6328-microm reflector measurementsM E Pedinoff, O M StafsuddApplied Optics|February 23, 2010
Refractive indices of ir materials: 10.6-microm ellipsometer measurementsM E Pedinoff, M Braunstein, O M StafsuddApplied Optics|April 17, 2010
Strain-induced anisotropy measurement in oxide films grown on siliconM E Pedinoff, D C Mayer, O M Stafsudd, et al.Applied Optics|February 21, 2008
Optical Measurement of Large Sphere Diameters by means of ScatteringS S Yi, O M StafsuddApplied Optics|June 23, 2010
Optical amplification of a multimode evanescently active planar optical waveguideW Y Liu, O M StafsuddApplied Optics|January 30, 2010
Characteristics of the continuous wave neutral argon laserA B Dauger, O M StafsuddApplied Optics|February 16, 2010
Power dependence of reflectivity of metallic filmsY C Yeh, O M StafsuddApplied Optics|January 23, 2010
CO(2) Laser with Simultaneous Active and Passive Q-SwitchingO M Stafsudd, O Ersoy, S PizzicaPageof 2