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Chemistry of Materials : a Publication of the American Chemical Society
|
February 19, 2019
From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity
Adriaan J M Mackus, Marc J M Merkx, Wilhelmus M M Kessels
Journal of Chemical Theory and Computation
|
June 3, 2026
AdsorPy: A Python Package for Lattice-Based Random Sequential Adsorption Simulations
Joost F W Maas, Ilker Tezsevin, Marc J M Merkx, et al.
ACS Nano
|
August 30, 2017
Area-Selective Atomic Layer Deposition of SiO<sub>2</sub> Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
Alfredo Mameli, Marc J M Merkx, Bora Karasulu, et al.
ACS Applied Materials & Interfaces
|
November 11, 2020
Nanoscale Encapsulation of Perovskite Nanocrystal Luminescent Films via Plasma-Enhanced SiO<sub>2</sub> Atomic Layer Deposition
Yao Jing, Marc J M Merkx, Jiaming Cai, et al.
ACS Materials Letters
|
May 19, 2020
Area-Selective Atomic Layer Deposition of Two-Dimensional WS<sub>2</sub> Nanolayers
Shashank Balasubramanyam, Marc J M Merkx, Marcel A Verheijen, et al.
Chemistry of Materials : a Publication of the American Chemical Society
|
July 28, 2025
Area-Selective Atomic Layer Deposition through Selective Passivation of SiO<sub>2</sub> with a SF<sub>6</sub>/H<sub>2</sub> Plasma
Olaf C A Bolkenbaas, Marc J M Merkx, Nicholas J Chittock, et al.
Journal of Materials Chemistry. C
|
November 25, 2024
Investigation of the atomic layer etching mechanism for Al<sub>2</sub>O<sub>3</sub> using hexafluoroacetylacetone and H<sub>2</sub> plasma
Nicholas J Chittock, Joost F W Maas, Ilker Tezsevin, et al.
The Journal of Physical Chemistry. C, Nanomaterials and Interfaces
|
March 25, 2022
Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors
Marc J M Merkx, Athanasios Angelidis, Alfredo Mameli, et al.
The Journal of Chemical Physics
|
May 22, 2024
In situ formation of inhibitor species through catalytic surface reactions during area-selective atomic layer deposition of TaN
Marc J M Merkx, Ilker Tezsevin, Pengmei Yu, et al.
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Search research articles
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Showing results (1-10 of 9) with videos related to
Sort By:
Page
of 1
Chemistry of Materials : a Publication of the American Chemical Society
|
February 19, 2019
From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity
Adriaan J M Mackus, Marc J M Merkx, Wilhelmus M M Kessels
Journal of Chemical Theory and Computation
|
June 3, 2026
AdsorPy: A Python Package for Lattice-Based Random Sequential Adsorption Simulations
Joost F W Maas, Ilker Tezsevin, Marc J M Merkx, et al.
ACS Nano
|
August 30, 2017
Area-Selective Atomic Layer Deposition of SiO<sub>2</sub> Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
Alfredo Mameli, Marc J M Merkx, Bora Karasulu, et al.
ACS Applied Materials & Interfaces
|
November 11, 2020
Nanoscale Encapsulation of Perovskite Nanocrystal Luminescent Films via Plasma-Enhanced SiO<sub>2</sub> Atomic Layer Deposition
Yao Jing, Marc J M Merkx, Jiaming Cai, et al.
ACS Materials Letters
|
May 19, 2020
Area-Selective Atomic Layer Deposition of Two-Dimensional WS<sub>2</sub> Nanolayers
Shashank Balasubramanyam, Marc J M Merkx, Marcel A Verheijen, et al.
Chemistry of Materials : a Publication of the American Chemical Society
|
July 28, 2025
Area-Selective Atomic Layer Deposition through Selective Passivation of SiO<sub>2</sub> with a SF<sub>6</sub>/H<sub>2</sub> Plasma
Olaf C A Bolkenbaas, Marc J M Merkx, Nicholas J Chittock, et al.
Journal of Materials Chemistry. C
|
November 25, 2024
Investigation of the atomic layer etching mechanism for Al<sub>2</sub>O<sub>3</sub> using hexafluoroacetylacetone and H<sub>2</sub> plasma
Nicholas J Chittock, Joost F W Maas, Ilker Tezsevin, et al.
The Journal of Physical Chemistry. C, Nanomaterials and Interfaces
|
March 25, 2022
Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors
Marc J M Merkx, Athanasios Angelidis, Alfredo Mameli, et al.
The Journal of Chemical Physics
|
May 22, 2024
In situ formation of inhibitor species through catalytic surface reactions during area-selective atomic layer deposition of TaN
Marc J M Merkx, Ilker Tezsevin, Pengmei Yu, et al.
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