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Applied Optics|August 12, 2025
Design of a grazing incidence illumination system for anamorphic extreme ultraviolet lithographyYuqing Chen, Tong Li, Yanqiu Li, et al.Optics Express|June 11, 2026
High stability double Stokes-Mueller polarimetry under oblique incidenceHuancheng Zhang, Zhe Zhao, Haining Li, et al.Applied Optics|May 15, 2013
Block-based mask optimization for optical lithographyXu Ma, Zhiyang Song, Yanqiu Li, et al.Nano Letters|September 15, 2005
Enhanced magnetooptical response in dumbbell-like Ag-CoFe2O4 nanoparticle pairsYanqiu Li, Qiang Zhang, Arto V Nurmikko, et al.Journal of the Optical Society of America. A, Optics, Image Science, and Vision|December 11, 2013
Improving wavefront reconstruction accuracy by using integration equations with higher-order truncation errors in the Southwell geometryGuanghui Li, Yanqiu Li, Ke Liu, et al.Applied Optics|October 17, 2014
Inverse pupil wavefront optimization for immersion lithographyChunying Han, Yanqiu Li, Lisong Dong, et al.Applied Optics|October 18, 2022
Design of an extreme ultraviolet lithography projection objective with a grouping design method through forward and reverse real ray tracingXu Yan, Yanqiu Li, Yuanhe Li, et al.IEEE Transactions on Visualization and Computer Graphics|April 7, 2023
Skeleton-based Human Action Recognition via Large-kernel Attention Graph Convolutional NetworkYanan Liu, Hao Zhang, Yanqiu Li, et al.Applied Optics|September 14, 2023
Implicit function characterization of the curvilinear mask to realize parametric optical proximity correction with a neighborhood parallel tabu searchPengzhi Wei, Yanqiu Li, Zhaoxuan Li, et al.Applied Optics|December 18, 2023
High-accuracy reconstruction of Stokes vectors via spatially modulated polarimetry using deep learning at low light fieldXinxin Zhang, Lihui Liu, Yanqiu Li, et al.Pageof 44