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Nanotechnology|February 27, 2020
Particle-substrate interactions in the laser deposition processViktoriia V Savchuk, Nicholas W Jenkins, Anatoliy O PinchukOptics Express|January 29, 2025
Robust broadband ptychography algorithms for high-harmonic soft X-ray supercontinuaBenjamin Shearer, Henry Kapteyn, Iona Binnie, et al.Optics Express|October 14, 2022
High-resolution, wavefront-sensing, full-field polarimetry of arbitrary beams using phase retrievalMatthew N Jacobs, Yuka Esashi, Nicholas W Jenkins, et al.Optics Express|March 27, 2021
Coherent Fourier scatterometry using orbital angular momentum beams for defect detectionBin Wang, Michael Tanksalvala, Zhe Zhang, et al.The Review of Scientific Instruments|December 18, 2023
Tabletop extreme ultraviolet reflectometer for quantitative nanoscale reflectometry, scatterometry, and imagingYuka Esashi, Nicholas W Jenkins, Yunzhe Shao, et al.Optics Express|October 15, 2022
Temporal and spectral multiplexing for EUV multibeam ptychography with a high harmonic light sourceNathan J Brooks, Bin Wang, Iona Binnie, et al.Science Advances|February 11, 2021
Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using phase-sensitive EUV imaging reflectometryMichael Tanksalvala, Christina L Porter, Yuka Esashi, et al.Pageof 1