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Journal of Nanoscience and Nanotechnology|April 2, 2010
High-aspect-ratio structure fabrication on (110)-oriented silicon surfaces using tribo-nanolithographyNoritaka Kawasegi, Noboru MoritaNanotechnology|August 10, 2011
Three-dimensional fabrication on GaAs surfaces using electron-beam-induced carbon deposition followed by wet chemical etchingNoboru Morita, Noritaka Kawasegi, Keitaro OoiThe Review of Scientific Instruments|March 5, 2008
Highly charged ion beam applied to lithography techniqueSadao Momota, Yoichi Nojiri, Jun Taniguchi, et al.Pageof 1