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Patrick Naulleau

Showing results (1-10 of 13) with videos related to

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Optics Express|July 10, 2012
Actinic microscope for extreme ultraviolet lithography photomask inspection and reviewMichael Goldstein, Patrick Naulleau
Applied Optics|May 17, 2003
Analysis of illumination coherence properties in small-source systems such as synchrotronsChang Chang, Patrick Naulleau, David Attwood
Applied Optics|August 3, 2002
Fourier transform interferometer alignment methodKenneth A Goldberg, Patrick Naulleau, Jeffrey Bokor
Applied Optics|March 10, 2018
Extreme ultraviolet mask roughness effects in high numerical aperture lithographyPatrick Naulleau, Yow-Gwo Wang, Tom Pistor
Optics Letters|December 17, 2008
Extreme-ultraviolet microexposure tool at 0.5 NA for sub-16 nm lithographyMichael Goldstein, Russ Hudyma, Patrick Naulleau, et al.
Applied Optics|December 28, 2002
Diffractive optical elements based on Fourier optical techniques: a new class of optics for extreme ultraviolet and soft x-ray wavelengthsChang Chang, Patrick Naulleau, Erik Anderson, et al.
The Journal of Chemical Physics|May 1, 2017
The importance of inner-shell electronic structure for enhancing the EUV absorption of photoresist materialsKristina D Closser, D Frank Ogletree, Patrick Naulleau, et al.
Optics Letters|November 21, 2007
Direct measurement of index of refraction in the extreme-ultraviolet wavelength region with a novel interferometerChang Chang, Erik Anderson, Patrick Naulleau, et al.
ACS Applied Materials & Interfaces|January 25, 2022
Mechanistic Advantages of Organotin Molecular EUV PhotoresistsJonathan H Ma, Craig Needham, Han Wang, et al.
Optics Express|October 17, 2014
Coded aperture detector: an image sensor with sub 20-nm pixel resolutionRyan Miyakawa, Rafael Mayer, Antoine Wojdyla, et al.
Pageof 2

Showing results (1-10 of 13) with videos related to

Sort By:
Pageof 2
Optics Express|July 10, 2012
Actinic microscope for extreme ultraviolet lithography photomask inspection and reviewMichael Goldstein, Patrick Naulleau
Applied Optics|May 17, 2003
Analysis of illumination coherence properties in small-source systems such as synchrotronsChang Chang, Patrick Naulleau, David Attwood
Applied Optics|August 3, 2002
Fourier transform interferometer alignment methodKenneth A Goldberg, Patrick Naulleau, Jeffrey Bokor
Applied Optics|March 10, 2018
Extreme ultraviolet mask roughness effects in high numerical aperture lithographyPatrick Naulleau, Yow-Gwo Wang, Tom Pistor
Optics Letters|December 17, 2008
Extreme-ultraviolet microexposure tool at 0.5 NA for sub-16 nm lithographyMichael Goldstein, Russ Hudyma, Patrick Naulleau, et al.
Applied Optics|December 28, 2002
Diffractive optical elements based on Fourier optical techniques: a new class of optics for extreme ultraviolet and soft x-ray wavelengthsChang Chang, Patrick Naulleau, Erik Anderson, et al.
The Journal of Chemical Physics|May 1, 2017
The importance of inner-shell electronic structure for enhancing the EUV absorption of photoresist materialsKristina D Closser, D Frank Ogletree, Patrick Naulleau, et al.
Optics Letters|November 21, 2007
Direct measurement of index of refraction in the extreme-ultraviolet wavelength region with a novel interferometerChang Chang, Erik Anderson, Patrick Naulleau, et al.
ACS Applied Materials & Interfaces|January 25, 2022
Mechanistic Advantages of Organotin Molecular EUV PhotoresistsJonathan H Ma, Craig Needham, Han Wang, et al.
Optics Express|October 17, 2014
Coded aperture detector: an image sensor with sub 20-nm pixel resolutionRyan Miyakawa, Rafael Mayer, Antoine Wojdyla, et al.
Pageof 2