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Nanotechnology|December 6, 2017
Optical proximity correction (OPC) in near-field lithography with pixel-based field sectioning time modulationSeonghyeon Oh, Dandan Han, Hyeon Bo Shim, et al.Optics Express|August 23, 2018
Analytical model for designing a high-energy-efficiency granular double-layer X-ray scintillator with a diffuse reflection layerJookwon Song, Hyeon Bo Shim, Jae W HahnScientific Reports|June 5, 2019
Theoretical analysis of high-efficient dielectric nanofocusing for the generation of a brightness light sourceChanghoon Park, Seonghyeon Oh, Jae W HahnOptics Letters|July 2, 2013
Multifunctional bowtie-shaped ridge aperture for overlay alignment in plasmonic direct writing lithography using a contact probeSeonghyeon Oh, Taekyong Lee, Jae W HahnScientific Reports|August 31, 2017
Nanoscale 2.5-dimensional surface patterning with plasmonic lithographyHowon Jung, Changhoon Park, Seonghyeon Oh, et al.Nanotechnology|March 21, 2013
Imaging heterogeneous nanostructures with a plasmonic resonant ridge apertureTaekyong Lee, Eungman Lee, Seonghyeon Oh, et al.Applied Optics|July 14, 2016
Analytical calculation of the light-collection efficiency of an optical emission spectrometer with the effective solid-angle methodMinwook Kang, Jae W HahnACS Applied Materials & Interfaces|September 1, 2020
Selective Emitter with Engineered Anisotropic Radiation to Minimize Dual-Band Thermal Signature for Infrared Stealth TechnologyChanghoon Park, Jagyeong Kim, Jae W HahnScientific Reports|March 31, 2017
Characterization of three-dimensional field distribution of bowtie aperture using quasi-spherical waves and surface plasmon polaritonsChanghoon Park, Howon Jung, Jae W HahnApplied Optics|May 13, 2021
Analyses of pattern quality in roll-to-roll digital maskless lithography with positional errorsChangmin Lee, Yunhyeok Ko, Jae W HahnPageof 31