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Journal of the American Society for Mass Spectrometry
|
August 13, 2017
TOF MS Investigation of Nickel Oxide CVD
Anastasia S Kondrateva, Maxim V Mishin, Sergey E Alexandrov
Journal of Nanoscience and Nanotechnology
|
December 19, 2015
Chain Assemblies from Nanoparticles Synthesized by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition: The Computational View
Maxim V Mishin, Kirill Y Zamotin, Vera S Protopopova, et al.
ACS Omega
|
April 21, 2020
Fast and Controllable Synthesis of Core-Shell Fe<sub>3</sub>O<sub>4</sub>-C Nanoparticles by Aerosol CVD
Irina A Tyurikova, Sergey E Alexandrov, Kirill S Tyurikov, et al.
Scientific Reports
|
November 18, 2020
High-temperature etching of SiC in SF<sub>6</sub>/O<sub>2</sub> inductively coupled plasma
Artem A Osipov, Gleb A Iankevich, Anastasia B Speshilova, et al.
Scientific Reports
|
February 27, 2023
Development of controlled nanosphere lithography technology
Artem A Osipov, Alina E Gagaeva, Anastasiya B Speshilova, et al.
Scientific Reports
|
March 29, 2022
OES diagnostics as a universal technique to control the Si etching structures profile in ICP
Artem A Osipov, Gleb A Iankevich, Anastasia B Speshilova, et al.
Page
of 1
Search research articles
Search
Showing results (1-10 of 6) with videos related to
Sort By:
Page
of 1
Journal of the American Society for Mass Spectrometry
|
August 13, 2017
TOF MS Investigation of Nickel Oxide CVD
Anastasia S Kondrateva, Maxim V Mishin, Sergey E Alexandrov
Journal of Nanoscience and Nanotechnology
|
December 19, 2015
Chain Assemblies from Nanoparticles Synthesized by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition: The Computational View
Maxim V Mishin, Kirill Y Zamotin, Vera S Protopopova, et al.
ACS Omega
|
April 21, 2020
Fast and Controllable Synthesis of Core-Shell Fe<sub>3</sub>O<sub>4</sub>-C Nanoparticles by Aerosol CVD
Irina A Tyurikova, Sergey E Alexandrov, Kirill S Tyurikov, et al.
Scientific Reports
|
November 18, 2020
High-temperature etching of SiC in SF<sub>6</sub>/O<sub>2</sub> inductively coupled plasma
Artem A Osipov, Gleb A Iankevich, Anastasia B Speshilova, et al.
Scientific Reports
|
February 27, 2023
Development of controlled nanosphere lithography technology
Artem A Osipov, Alina E Gagaeva, Anastasiya B Speshilova, et al.
Scientific Reports
|
March 29, 2022
OES diagnostics as a universal technique to control the Si etching structures profile in ICP
Artem A Osipov, Gleb A Iankevich, Anastasia B Speshilova, et al.
Page
of 1