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Sikun Li

Showing results (1-10 of 36) with videos related to

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Applied Optics|October 20, 2017
Optimal defocus selection based on normed Fourier transform for digital fringe pattern profilometryAbel Kamagara, Xiangzhao Wang, Sikun Li
Applied Optics|December 24, 2009
Spatial carrier fringe pattern phase demodulation by use of a two-dimensional real waveletSikun Li, Xianyu Su, Wenjing Chen
Applied Optics|June 21, 2008
Reliability-guided phase unwrapping in wavelet-transform profilometrySikun Li, Wenjing Chen, Xianyu Su
Optics Express|August 13, 2025
Synthetic holographic mask design for computational proximity lithography using the lithography-guided OMRAF methodYuyang Liu, Sikun Li, Dongchao Pan
Applied Optics|September 14, 2023
Rigorous simulation model of double-Ronchi shearing interferometry on lithographic toolsZhiyuan Niu, Sikun Li, Yang Liu
Optics Express|October 29, 2020
Source mask optimization using the covariance matrix adaptation evolution strategyGuodong Chen, Sikun Li, Xiangzhao Wang
Journal of the Optical Society of America. A, Optics, Image Science, and Vision|May 29, 2010
Wavelet ridge techniques in optical fringe pattern analysisSikun Li, Xianyu Su, Wenjing Chen
Optics Express|June 22, 2021
Efficient optical proximity correction based on virtual edge and mask pixelation with two-phase samplingGuodong Chen, Sikun Li, Xiangzhao Wang
Journal of the Optical Society of America. A, Optics, Image Science, and Vision|May 5, 2009
Eliminating the zero spectrum in Fourier transform profilometry using empirical mode decompositionSikun Li, Xianyu Su, Wenjing Chen, et al.
Applied Optics|September 9, 2020
Fast rigorous mask model for extreme ultraviolet lithographyZinan Zhang, Sikun Li, Xiangzhao Wang, et al.
Pageof 4

Showing results (1-10 of 36) with videos related to

Sort By:
Pageof 4
Applied Optics|October 20, 2017
Optimal defocus selection based on normed Fourier transform for digital fringe pattern profilometryAbel Kamagara, Xiangzhao Wang, Sikun Li
Applied Optics|December 24, 2009
Spatial carrier fringe pattern phase demodulation by use of a two-dimensional real waveletSikun Li, Xianyu Su, Wenjing Chen
Applied Optics|June 21, 2008
Reliability-guided phase unwrapping in wavelet-transform profilometrySikun Li, Wenjing Chen, Xianyu Su
Optics Express|August 13, 2025
Synthetic holographic mask design for computational proximity lithography using the lithography-guided OMRAF methodYuyang Liu, Sikun Li, Dongchao Pan
Applied Optics|September 14, 2023
Rigorous simulation model of double-Ronchi shearing interferometry on lithographic toolsZhiyuan Niu, Sikun Li, Yang Liu
Optics Express|October 29, 2020
Source mask optimization using the covariance matrix adaptation evolution strategyGuodong Chen, Sikun Li, Xiangzhao Wang
Journal of the Optical Society of America. A, Optics, Image Science, and Vision|May 29, 2010
Wavelet ridge techniques in optical fringe pattern analysisSikun Li, Xianyu Su, Wenjing Chen
Optics Express|June 22, 2021
Efficient optical proximity correction based on virtual edge and mask pixelation with two-phase samplingGuodong Chen, Sikun Li, Xiangzhao Wang
Journal of the Optical Society of America. A, Optics, Image Science, and Vision|May 5, 2009
Eliminating the zero spectrum in Fourier transform profilometry using empirical mode decompositionSikun Li, Xianyu Su, Wenjing Chen, et al.
Applied Optics|September 9, 2020
Fast rigorous mask model for extreme ultraviolet lithographyZinan Zhang, Sikun Li, Xiangzhao Wang, et al.
Pageof 4