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Sikun Li

Showing results (11-20 of 36) with videos related to

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Applied Optics|June 18, 2021
Extreme ultraviolet phase defect characterization based on complex amplitudes of the aerial imagesWei Cheng, Sikun Li, Xiangzhao Wang, et al.
Optics Express|December 19, 2025
High-efficiency EUV mask defect compensation method based on the pixelated absorber layer correctionHanzhi Zhang, Sikun Li, Xiaowei Song, et al.
The Journal of Chemical Physics|March 10, 2025
Accelerating polymer self-consistent field simulation and inverse DSA-lithography with deep neural networksHaolan Wang, Sikun Li, Jiale Zeng, et al.
Applied Optics|April 27, 2012
Two-dimensional wavelet transform for reliability-guided phase unwrapping in optical fringe pattern analysisSikun Li, Xiangzhao Wang, Xianyu Su, et al.
Applied Optics|September 14, 2023
Effects and elimination of image grating defocusing on a double-Ronchi shearing interference fieldYang Liu, Feng Tang, Sikun Li, et al.
Applied Optics|October 18, 2022
Through-focus EUV multilayer defect compensation considering optical proximity correctionWei Cheng, Sikun Li, Xiangzhao Wang, et al.
Optics Express|July 16, 2021
Fast heuristic-based source mask optimization for EUV lithography using dual edge evolution and partial samplingZinan Zhang, Sikun Li, Xiangzhao Wang, et al.
Optics Letters|June 5, 2012
Analytical approach to the impact of polarization aberration on lithographic imagingYuanying Tu, Xiangzhao Wang, Sikun Li, et al.
Applied Optics|July 15, 2021
Fast mask model for extreme ultraviolet lithography with a slanted absorber sidewallZinan Zhang, Sikun Li, Xiangzhao Wang, et al.
Optics Express|June 11, 2026
Three-dimensional absorber correction for EUV mask defect compensationHanzhi Zhang, Sikun Li, Xiaowei Song, et al.
Pageof 4

Showing results (11-20 of 36) with videos related to

Sort By:
Pageof 4
Applied Optics|June 18, 2021
Extreme ultraviolet phase defect characterization based on complex amplitudes of the aerial imagesWei Cheng, Sikun Li, Xiangzhao Wang, et al.
Optics Express|December 19, 2025
High-efficiency EUV mask defect compensation method based on the pixelated absorber layer correctionHanzhi Zhang, Sikun Li, Xiaowei Song, et al.
The Journal of Chemical Physics|March 10, 2025
Accelerating polymer self-consistent field simulation and inverse DSA-lithography with deep neural networksHaolan Wang, Sikun Li, Jiale Zeng, et al.
Applied Optics|April 27, 2012
Two-dimensional wavelet transform for reliability-guided phase unwrapping in optical fringe pattern analysisSikun Li, Xiangzhao Wang, Xianyu Su, et al.
Applied Optics|September 14, 2023
Effects and elimination of image grating defocusing on a double-Ronchi shearing interference fieldYang Liu, Feng Tang, Sikun Li, et al.
Applied Optics|October 18, 2022
Through-focus EUV multilayer defect compensation considering optical proximity correctionWei Cheng, Sikun Li, Xiangzhao Wang, et al.
Optics Express|July 16, 2021
Fast heuristic-based source mask optimization for EUV lithography using dual edge evolution and partial samplingZinan Zhang, Sikun Li, Xiangzhao Wang, et al.
Optics Letters|June 5, 2012
Analytical approach to the impact of polarization aberration on lithographic imagingYuanying Tu, Xiangzhao Wang, Sikun Li, et al.
Applied Optics|July 15, 2021
Fast mask model for extreme ultraviolet lithography with a slanted absorber sidewallZinan Zhang, Sikun Li, Xiangzhao Wang, et al.
Optics Express|June 11, 2026
Three-dimensional absorber correction for EUV mask defect compensationHanzhi Zhang, Sikun Li, Xiaowei Song, et al.
Pageof 4