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Taian Fan

Showing results (1-10 of 8) with videos related to

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Optics Express|November 29, 2023
Three-dimensional plasmonic lithography imaging modeling based on the RCWA algorithm for computational lithographyHuwen Ding, Taian Fan, Libin Zhang, et al.
Optics Express|April 27, 2022
Fast aerial image model for EUV lithography using the adjoint fully convolutional networkJiaxin Lin, Lisong Dong, Taian Fan, et al.
Optics Express|March 5, 2024
Dynamic budget analysis of multiple parameters in a lithography system based on the superposition of light intensity fluctuationsJiashuo Wang, Xiaojing Su, Lisong Dong, et al.
Optics Express|September 13, 2019
Learning-based compressive sensing method for EUV lithographic source optimizationJiaxin Lin, Lisong Dong, Taian Fan, et al.
Optics Letters|September 29, 2017
Mitigating the influence of wafer topography on the implantation process in optical lithographyLisong Dong, Wenhui Chen, Taian Fan, et al.
Applied Optics|April 1, 2020
Fast extreme ultraviolet lithography mask near-field calculation method based on machine learningJiaxin Lin, Lisong Dong, Taian Fan, et al.
Optics Express|July 30, 2025
Rect-SRAF method in inverse lithography technologyFei Ai, Xiaojing Su, Lisong Dong, et al.
Optics Express|October 15, 2022
Study on forbidden pitch in plasmonic lithography: taking 365 nm wavelength thin silver film-based superlens imaging lithography as an exampleHuwen Ding, Lihong Liu, Lisong Dong, et al.
Pageof 1

Showing results (1-10 of 8) with videos related to

Sort By:
Pageof 1
Optics Express|November 29, 2023
Three-dimensional plasmonic lithography imaging modeling based on the RCWA algorithm for computational lithographyHuwen Ding, Taian Fan, Libin Zhang, et al.
Optics Express|April 27, 2022
Fast aerial image model for EUV lithography using the adjoint fully convolutional networkJiaxin Lin, Lisong Dong, Taian Fan, et al.
Optics Express|March 5, 2024
Dynamic budget analysis of multiple parameters in a lithography system based on the superposition of light intensity fluctuationsJiashuo Wang, Xiaojing Su, Lisong Dong, et al.
Optics Express|September 13, 2019
Learning-based compressive sensing method for EUV lithographic source optimizationJiaxin Lin, Lisong Dong, Taian Fan, et al.
Optics Letters|September 29, 2017
Mitigating the influence of wafer topography on the implantation process in optical lithographyLisong Dong, Wenhui Chen, Taian Fan, et al.
Applied Optics|April 1, 2020
Fast extreme ultraviolet lithography mask near-field calculation method based on machine learningJiaxin Lin, Lisong Dong, Taian Fan, et al.
Optics Express|July 30, 2025
Rect-SRAF method in inverse lithography technologyFei Ai, Xiaojing Su, Lisong Dong, et al.
Optics Express|October 15, 2022
Study on forbidden pitch in plasmonic lithography: taking 365 nm wavelength thin silver film-based superlens imaging lithography as an exampleHuwen Ding, Lihong Liu, Lisong Dong, et al.
Pageof 1