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Thomas R Albrecht

Showing results (1-10 of 9) with videos related to

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ACS Nano|December 25, 2010
Rectangular patterns using block copolymer directed assembly for high bit aspect ratio patterned mediaRicardo Ruiz, Elizabeth Dobisz, Thomas R Albrecht
ACS Nano|July 18, 2017
Self-Registered Self-Assembly of Block CopolymersLei Wan, Ricardo Ruiz, He Gao, et al.
ACS Applied Materials & Interfaces|May 26, 2015
Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOSTJulia Cushen, Lei Wan, Gregory Blachut, et al.
Nanotechnology|February 7, 2015
Transfer of self-aligned spacer patterns for single-digit nanofabricationGregory S Doerk, He Gao, Lei Wan, et al.
ACS Nano|June 6, 2015
The Limits of Lamellae-Forming PS-b-PMMA Block Copolymers for LithographyLei Wan, Ricardo Ruiz, He Gao, et al.
Science (New York, N.Y.)|August 16, 2008
Density multiplication and improved lithography by directed block copolymer assemblyRicardo Ruiz, Huiman Kang, François A Detcheverry, et al.
Nano Letters|June 14, 2016
Template-Assisted Direct Growth of 1 Td/in(2) Bit Patterned MediaEn Yang, Zuwei Liu, Hitesh Arora, et al.
Chemistry of Materials : a Publication of the American Chemical Society|October 26, 2020
The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer LithographyDaniel F Sunday, Xuanxuan Chen, Thomas R Albrecht, et al.
Science Advances|April 7, 2016
Nanoscale chemical imaging by photoinduced force microscopyDerek Nowak, William Morrison, H Kumar Wickramasinghe, et al.
Pageof 1

Showing results (1-10 of 9) with videos related to

Sort By:
Pageof 1
ACS Nano|December 25, 2010
Rectangular patterns using block copolymer directed assembly for high bit aspect ratio patterned mediaRicardo Ruiz, Elizabeth Dobisz, Thomas R Albrecht
ACS Nano|July 18, 2017
Self-Registered Self-Assembly of Block CopolymersLei Wan, Ricardo Ruiz, He Gao, et al.
ACS Applied Materials & Interfaces|May 26, 2015
Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOSTJulia Cushen, Lei Wan, Gregory Blachut, et al.
Nanotechnology|February 7, 2015
Transfer of self-aligned spacer patterns for single-digit nanofabricationGregory S Doerk, He Gao, Lei Wan, et al.
ACS Nano|June 6, 2015
The Limits of Lamellae-Forming PS-b-PMMA Block Copolymers for LithographyLei Wan, Ricardo Ruiz, He Gao, et al.
Science (New York, N.Y.)|August 16, 2008
Density multiplication and improved lithography by directed block copolymer assemblyRicardo Ruiz, Huiman Kang, François A Detcheverry, et al.
Nano Letters|June 14, 2016
Template-Assisted Direct Growth of 1 Td/in(2) Bit Patterned MediaEn Yang, Zuwei Liu, Hitesh Arora, et al.
Chemistry of Materials : a Publication of the American Chemical Society|October 26, 2020
The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer LithographyDaniel F Sunday, Xuanxuan Chen, Thomas R Albrecht, et al.
Science Advances|April 7, 2016
Nanoscale chemical imaging by photoinduced force microscopyDerek Nowak, William Morrison, H Kumar Wickramasinghe, et al.
Pageof 1