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Todd R Younkin

Showing results (1-10 of 6) with videos related to

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Chemical Communications (Cambridge, England)|October 2, 2003
Synthesis of neutral nickel catalysts for ethylene polymerization--the influence of ligand size on catalyst stabilityEric F Connor, Todd R Younkin, Jason I Henderson, et al.
Optics Express|November 29, 2012
Evidence of speckle in extreme-UV lithographyAlessandro Vaglio Pret, Roel Gronheid, Jan Engelen, et al.
ACS Nano|June 26, 2012
Kinetic rates of thermal transformations and diffusion in polymer systems measured during sub-millisecond laser-induced heatingByungki Jung, Jing Sha, Florencia Paredes, et al.
Journal of the American Chemical Society|July 3, 2009
Fluorinated acid amplifiers for EUV lithographySeth Kruger, Sri Revuru, Craig Higgins, et al.
Macromolecular Rapid Communications|May 14, 2011
Patterning of tailored polycarbonate based non-chemically amplified resists using extreme ultraviolet lithographyAnguang Yu, Heping Liu, James P Blinco, et al.
Optics Express|October 30, 2008
Electro-optic polymer cladding ring resonator modulatorsBruce A Block, Todd R Younkin, Paul S Davids, et al.
Pageof 1

Showing results (1-10 of 6) with videos related to

Sort By:
Pageof 1
Chemical Communications (Cambridge, England)|October 2, 2003
Synthesis of neutral nickel catalysts for ethylene polymerization--the influence of ligand size on catalyst stabilityEric F Connor, Todd R Younkin, Jason I Henderson, et al.
Optics Express|November 29, 2012
Evidence of speckle in extreme-UV lithographyAlessandro Vaglio Pret, Roel Gronheid, Jan Engelen, et al.
ACS Nano|June 26, 2012
Kinetic rates of thermal transformations and diffusion in polymer systems measured during sub-millisecond laser-induced heatingByungki Jung, Jing Sha, Florencia Paredes, et al.
Journal of the American Chemical Society|July 3, 2009
Fluorinated acid amplifiers for EUV lithographySeth Kruger, Sri Revuru, Craig Higgins, et al.
Macromolecular Rapid Communications|May 14, 2011
Patterning of tailored polycarbonate based non-chemically amplified resists using extreme ultraviolet lithographyAnguang Yu, Heping Liu, James P Blinco, et al.
Optics Express|October 30, 2008
Electro-optic polymer cladding ring resonator modulatorsBruce A Block, Todd R Younkin, Paul S Davids, et al.
Pageof 1