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Optics Express|March 14, 2013
Light absorption in conical silicon particlesJ Bogdanowicz, M Gilbert, N Innocenti, et al.
Nanoscale|July 22, 2016
Nanoscopic structural rearrangements of the Cu-filament in conductive-bridge memoriesU Celano, G Giammaria, L Goux, et al.
Ultramicroscopy|March 13, 2018
Laser-assisted atom probe tomography of semiconductors: The impact of the focused-ion beam specimen preparationJ Bogdanowicz, A Kumar, C Fleischmann, et al.
Ultramicroscopy|May 2, 2017
Atom probe tomography analysis of SiGe fins embedded in SiO2: Facts and artefactsD Melkonyan, C Fleischmann, L Arnoldi, et al.
Ultramicroscopy|December 15, 2017
Wet-chemical etching of atom probe tips for artefact free analyses of nanoscaled semiconductor structuresD Melkonyan, C Fleischmann, A Veloso, et al.
Ultramicroscopy|February 5, 2011
Characteristics of cross-sectional atom probe analysis on semiconductor structuresS Koelling, N Innocenti, G Hellings, et al.
Nano Letters|May 17, 2013
Direct imaging of 3D atomic-scale dopant-defect clustering processes in ion-implanted siliconS Koelling, O Richard, H Bender, et al.
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