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Weiyin Gu

Showing results (1-10 of 12) with videos related to

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ACS Nano|October 25, 2012
Orienting block copolymer microdomains with block copolymer brushesWeiyin Gu, Sung Woo Hong, Thomas P Russell
ACS Nano|February 5, 2011
Highly ordered nanoporous template from triblock copolymerDong Hyun Lee, Soojin Park, Weiyin Gu, et al.
Advanced Materials (Deerfield Beach, Fla.)|November 28, 2013
An in situ grazing incidence X-ray scattering study of block copolymer thin films during solvent vapor annealingXiaodan Gu, Ilja Gunkel, Alexander Hexemer, et al.
Advanced Materials (Deerfield Beach, Fla.)|July 23, 2013
Line patterns from cylinder-forming photocleavable block copolymersWeiyin Gu, Hui Zhao, Qingshuo Wei, et al.
ACS Nano|February 2, 2013
Self-assembly of symmetric brush diblock copolymersWeiyin Gu, June Huh, Sung Woo Hong, et al.
ACS Nano|June 18, 2015
Correction to Self-Assembly of Symmetric Brush Diblock CopolymersWeiyin Gu, June Huh, Sung Woo Hong, et al.
ACS Macro Letters|May 18, 2022
Photocleavable Triblock Copolymers Featuring an Activated Ester Middle Block: "One-Step" Synthesis and Application as Locally Reactive Nanoporous Thin FilmsHui Zhao, Weiyin Gu, Ryohei Kakuchi, et al.
ACS Macro Letters|May 20, 2022
Correction to Photocleavable Triblock Copolymers Featuring an Activated Ester Middle Block: "One-Step" Synthesis and Application as Locally Reactive Nanoporous Thin FilmsHui Zhao, Weiyin Gu, Ryohei Kakuchi, et al.
ACS Nano|October 26, 2013
On the self-assembly of brush block copolymers in thin filmsSung Woo Hong, Weiyin Gu, June Huh, et al.
Advanced Materials (Deerfield Beach, Fla.)|November 26, 2011
Fabrication of silicon oxide nanodots with an areal density beyond 1 teradots inch(-2)Ji Xu, Sung Woo Hong, Weiyin Gu, et al.
Pageof 2

Showing results (1-10 of 12) with videos related to

Sort By:
Pageof 2
ACS Nano|October 25, 2012
Orienting block copolymer microdomains with block copolymer brushesWeiyin Gu, Sung Woo Hong, Thomas P Russell
ACS Nano|February 5, 2011
Highly ordered nanoporous template from triblock copolymerDong Hyun Lee, Soojin Park, Weiyin Gu, et al.
Advanced Materials (Deerfield Beach, Fla.)|November 28, 2013
An in situ grazing incidence X-ray scattering study of block copolymer thin films during solvent vapor annealingXiaodan Gu, Ilja Gunkel, Alexander Hexemer, et al.
Advanced Materials (Deerfield Beach, Fla.)|July 23, 2013
Line patterns from cylinder-forming photocleavable block copolymersWeiyin Gu, Hui Zhao, Qingshuo Wei, et al.
ACS Nano|February 2, 2013
Self-assembly of symmetric brush diblock copolymersWeiyin Gu, June Huh, Sung Woo Hong, et al.
ACS Nano|June 18, 2015
Correction to Self-Assembly of Symmetric Brush Diblock CopolymersWeiyin Gu, June Huh, Sung Woo Hong, et al.
ACS Macro Letters|May 18, 2022
Photocleavable Triblock Copolymers Featuring an Activated Ester Middle Block: "One-Step" Synthesis and Application as Locally Reactive Nanoporous Thin FilmsHui Zhao, Weiyin Gu, Ryohei Kakuchi, et al.
ACS Macro Letters|May 20, 2022
Correction to Photocleavable Triblock Copolymers Featuring an Activated Ester Middle Block: "One-Step" Synthesis and Application as Locally Reactive Nanoporous Thin FilmsHui Zhao, Weiyin Gu, Ryohei Kakuchi, et al.
ACS Nano|October 26, 2013
On the self-assembly of brush block copolymers in thin filmsSung Woo Hong, Weiyin Gu, June Huh, et al.
Advanced Materials (Deerfield Beach, Fla.)|November 26, 2011
Fabrication of silicon oxide nanodots with an areal density beyond 1 teradots inch(-2)Ji Xu, Sung Woo Hong, Weiyin Gu, et al.
Pageof 2