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Journal of the American Chemical Society|October 19, 2023
Charge Shielding-Oriented Design of Zinc-Based Nanoparticle Liquids for Controlled NanofabricationPeipei Tao, Qianqian Wang, Michaela Vockenhuber, et al.
Science Advances|April 19, 2023
Resistless EUV lithography: Photon-induced oxide patterning on siliconLi-Ting Tseng, Prajith Karadan, Dimitrios Kazazis, et al.
Nature Communications|January 24, 2024
EUV-induced hydrogen desorption as a step towards large-scale silicon quantum device patterningProcopios Constantinou, Taylor J Z Stock, Li-Ting Tseng, et al.
Nano Letters|September 26, 2007
Three-dimensional Si/Ge quantum dot crystalsDetlev Grützmacher, Thomas Fromherz, Christian Dais, et al.
ACS Omega|August 29, 2022
Molecular Glass Resists Based on Tetraphenylsilane Derivatives: Effect of Protecting Ratios on Advanced LithographyYake Wang, Jinping Chen, Yi Zeng, et al.
Nanoscale|August 19, 2025
van der Waals devices for surface-sensitive experimentsNicolai Taufertshöfer, Corinna Burri, Rok Venturini, et al.
Nano Letters|June 10, 2022
Charge Configuration Memory Devices: Energy Efficiency and Switching SpeedAnze Mraz, Rok Venturini, Damjan Svetin, et al.
ACS Applied Materials & Interfaces|August 5, 2024
Extreme Ultraviolet Photoresponse of Organotin-Based Photoresists with Borate CounteranionsQuentin Evrard, Najmeh Sadegh, Simon Mathew, et al.
Nature Communications|November 21, 2025
Imaging of electrically controlled van der Waals layer stacking in 1T-TaS2Corinna Burri, Nelson Hua, Dario Ferreira Sanchez, et al.
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