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Applied Optics|July 9, 2002
Fabrication of optics by use of plasma chemical vaporization machining with a pipe electrodeHideo Takino, Norio Shibata, Hiroshi Itoh, et al.The Review of Scientific Instruments|January 1, 2022
High-throughput deterministic plasma etching using array-type plasma generator systemYasuhisa Sano, Ken Nishida, Ryohei Asada, et al.Optics Express|February 9, 2019
Compact reflective imaging optics in hard X-ray region based on concave and convex mirrorsJumpei Yamada, Satoshi Matsuyama, Yasuhisa Sano, et al.Optics Express|September 10, 2020
High-resolution micro channel-cut crystal monochromator processed by plasma chemical vaporization machining for a reflection self-seeded X-ray free-electron laserShotaro Matsumura, Taito Osaka, Ichiro Inoue, et al.Journal of Synchrotron Radiation|March 12, 2019
X-ray optics for advanced ultrafast pump-probe X-ray experiments at SACLATetsuo Katayama, Takashi Hirano, Yuki Morioka, et al.Journal of Synchrotron Radiation|September 7, 2019
A micro channel-cut crystal X-ray monochromator for a self-seeded hard X-ray free-electron laserTaito Osaka, Ichiro Inoue, Ryota Kinjo, et al.Journal of Nanoscience and Nanotechnology|July 23, 2011
Efficient wet etching of GaN (0001) substrate with subsurface damage layerShun Sadakuni, Junji Murata, Keita Yagi, et al.The Review of Scientific Instruments|May 3, 2019
Catalyzed chemical polishing of SiO<sub>2</sub> glasses in pure waterDaisetsu Toh, Pho Van Bui, Ai Isohashi, et al.Optics Express|May 4, 2016
Wavelength-tunable split-and-delay optical system for hard X-ray free-electron lasersTaito Osaka, Takashi Hirano, Yasuhisa Sano, et al.Optics Express|November 13, 2015
Damage threshold of platinum/carbon multilayers under hard X-ray free-electron laser irradiationJangwoo Kim, Ayaka Nagahira, Takahisa Koyama, et al.Pageof 5