Wilhelmus M M Kessels

38PUBLICATIONS
70CO-AUTHORS
Nanofabrication, growth and self assemblyElectrical energy generation (incl. renewables, excl. photovoltaics)Organometallic chemistryChemical and thermal processes in energy and combustionElemental semiconductors
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Publications (38)

|May 18, 2026
Atomic Layer Etching of Nickel Using N2/H2 Plasma Exposure and Hexafluoroacetylacetone.

|Dec 18, 2025
Spatial Atomic Layer Deposition of IrO x Using (EtCp)Ir(CHD) and Atmospheric O2/N2 Plasma.

Mike L van de Poll, Jie Shen, Paul Poodt

|Dec 17, 2025
Growth behavior during metalorganic chemical vapor deposition of MoS2using di-tert-butyl sulfide as organic sulfur precursor.

Sanne Deijkers, Henry Medina Silva, Apostolia Manasi

|Jul 28, 2025
Area-Selective Atomic Layer Deposition through Selective Passivation of SiO2 with a SF6/H2 Plasma.

Olaf C A Bolkenbaas, Marc J M Merkx, Nicholas J Chittock

|Feb 19, 2025
Plasma-Enhanced Spatial Atomic Layer Deposition on 2D and 3D Surface Topologies: The Case of Amorphous and Crystalline TiO2.

Mike van de Poll, Jie Shen, James Hilfiker

|Nov 25, 2024
Investigation of the atomic layer etching mechanism for Al2O3 using hexafluoroacetylacetone and H2 plasma.

Nicholas J Chittock, Joost F W Maas, Ilker Tezsevin

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Frequent Collaborators

11 joint publications

Adriaan J M Mackus

9 joint publications

Ageeth A Bol

8 joint publications

Marcel Verheijen

7 joint publications

Marc J M Merkx