Fabricación rápida de estructuras periódicas personalizables mediante litografía de interferencia DMD-Dammann

We present a hybrid lithography approach integrating digital micromirror device (DMD) projection with multi-beam interference enabled by a Dammann grating. This approach allows for the rapid fabrication of two-dimensional complex periodic structures with low exposure dose and simplified image design. Simulations and experimental results confirm the tunability of patterned structures through three key parameters: DMD image modulation, grating angle adjustment, and exposure dose control. Periodic dot arrays, gradient-duty-ratio superlattices, and photonic crystal waveguides, such as beam splitters, right-angle bends, and resonant rings, were successfully fabricated. Notably, compared to conventional direct DMD lithography, our approach achieves a 25-fold improvement in energy efficiency. The versatility and scalability of DMD-Dammann interference lithography demonstrate its potential for high-throughput fabrication of photonic crystal devices and optical microarrays.