DMD-ダマン干渉リソグラフィを用いたカスタマイズ可能な周期構造の高速作製

We present a hybrid lithography approach integrating digital micromirror device (DMD) projection with multi-beam interference enabled by a Dammann grating. This approach allows for the rapid fabrication of two-dimensional complex periodic structures with low exposure dose and simplified image design. Simulations and experimental results confirm the tunability of patterned structures through three key parameters: DMD image modulation, grating angle adjustment, and exposure dose control. Periodic dot arrays, gradient-duty-ratio superlattices, and photonic crystal waveguides, such as beam splitters, right-angle bends, and resonant rings, were successfully fabricated. Notably, compared to conventional direct DMD lithography, our approach achieves a 25-fold improvement in energy efficiency. The versatility and scalability of DMD-Dammann interference lithography demonstrate its potential for high-throughput fabrication of photonic crystal devices and optical microarrays.