CuO

Roland Widmer1, Franz-Josef Haug, Pascal Ruffieux

  • 1Empa, Swiss Federal Laboratories for Materials Testing and Research, nanotech@surfaces Laboratory, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland. roland.widmer@empa.ch

概括

基拉尔酸 (TA) 能够使同体基拉尔氧化铜 (CuO) 薄膜的电化学沉积. X射线光电子衍射 (XPD) 证实了表面和方向控制,证明了反选择性膜的生长.