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基于不对称补丁数据的EUV面罩的快速衍射模型.

Ziqi Li, Xuyu Jing, Lisong Dong

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    |September 14, 2023
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    概括

    这项研究介绍了极紫外线 (EUV) 面具的快速衍射近场 (DNF) 模型. 这种新的方法显著减少了EUV光刻模型的计算时间,同时保持了准确性.

    科学领域:

    • 光学和光子学 在光学和光子学.
    • 计算式 lithography 的使用方法.
    • 半导体制造业 半导体制造业

    背景情况:

    • 对三维 (3D) 面具的近场衍射 (DNF) 的准确建模对于极端紫外线 (EUV) 光刻成像至关重要.
    • 现有的模型可能面临计算挑战,因为3D面具结构的复杂性和EUV系统的不对称成像特征.

    研究的目的:

    • 开发一个计算效率高,准确的模型来模拟3D EUV 面具的 DNF.
    • 在速度和资源要求方面解决当前建模技术的局限性.

    主要方法:

    • 提出了一个基于非对称补丁数据拟合方法的快速DNF模型.
    • 一个DNF库是使用各种方向的训练面具补丁及其严格的DNF结果构建的.
    • 开发了一个基于卷积的紧模型,卷积内核被反向计算以适应训练数据.

    主要成果:

    • 拟议的模型显示了计算时间的显著减少,与基于最先进的机器学习的EUV面具模型相比,实现了60% - 70%的更快的模拟.
    • 拟议方法的模拟准确性与现有的先进模型相美.
    • 该模型有效地处理具有代表性的局部面具特征,如角落和边缘.

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    • 开发的快速DNF模型为EUV面具建模提供了高效的解决方案.
    • 这种方法为推进EUV光刻成像成像建模以降低计算成本提供了有价值的工具.
    • 该方法在加速EUV面具的设计和分析方面表现有前途.