Related Experiment Video
Updated: Sep 30, 2026
Measurement of Scattering Nonlinearities from a Single Plasmonic Nanoparticle
Published on: January 3, 2016
Light-scattering measurements of optical thin-film components at 157 and 193 nm
Stefan Gliech1, Jörg Steinert, Angela Duparré
1Fraunhofer Institute for Applied Optics and Precision Engineering, Jena, Germany.
Abstract:
An instrument for total backscattering and forward-scattering measurements of optical coating components at 157 and 193 nm is described. The system is operated in both vacuum and nitrogen purge gas. An excimer laser as well as a deuterium lamp can be used as a radiation source. Suppression of the background signal level to 1 part in 10(6) permits measurements even of low-scatter samples such as superpolished substrates and antireflection coatings. Results of investigations of antireflective and highly reflective multilayers and CaF2 substrates reveal scattering from surface and interface roughness as well as from the volume of the substrate material. First steps to extend the instrument for angle-resolved scatter, transmittance, and reflectance measurements are described.
