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Updated: Sep 23, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
Published on: September 14, 2018
Towards sub-0.5 A electron beams
O L Krivanek1, P D Nellist, N Dellby
1Nion Co., 1102 8th St, Kirkland, WA 98033, USA. krivanek@nion.com
Abstract:
In the 4 years since the previous meeting in the SALSA series, aberration correction has progressed from a promising concept to a powerful research tool. We summarize the factors that have enabled 100-120kV scanning transmission electron microscopes to achieve sub-A resolution, and to increase the current available in an atom-sized probe by a factor of 10 and more. Once C(s) is corrected, fifth-order spherical aberration (C(5)) and chromatic aberration (C(c)) pose new limits on resolution. We describe a quadrupole/octupole corrector of a new design, which will correct all fifth-order aberrations while introducing less than 0.2mm of additional C(c). Coupled to an optimized STEM column, the new corrector promises to lead to routine sub-A electron probes at 100kV, and to sub-0.5A probes at higher operating voltages.
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