Quantitative analysis with desorption/ionization on silicon mass spectrometry using electrospray deposition

Area of Science:

• Analytical Chemistry
• Mass Spectrometry
• Surface Science

Background:

• Desorption/ionization on silicon mass spectrometry (DIOS-MS) is a surface-based ionization technique.
• Quantitative analysis using DIOS-MS has faced challenges with sample homogeneity and reproducibility.
• Electrospray deposition (ESD) is a technique for controlled sample deposition.

Purpose of the Study:

• To demonstrate the utility of DIOS-MS as a quantitative analytical tool.
• To investigate the impact of electrospray deposition (ESD) on DIOS-MS quantitative performance.
• To analyze peptides and amino acids using DIOS-MS with internal standards.

Main Methods:

• Quantitative analysis of peptides and amino acids using DIOS-MS.
• Application of electrospray deposition (ESD) for sample preparation on porous silicon.
• Comparison of traditional dried droplet method with ESD for sample deposition.
• Utilizing deuterated and structural analogues as internal standards for quantification.

Main Results:

• Electrospray deposition (ESD) significantly improved sample homogeneity on porous silicon surfaces.
• ESD enhanced the quantitative accuracy and sample-to-sample reproducibility in DIOS-MS.
• The developed method allowed for sample deposition at low flow rates (150 nL/min) suitable for LC-DIOS.
• ESD-prepared samples showed superior performance compared to the traditional dried droplet method.

Conclusions:

• DIOS-MS coupled with ESD is a robust quantitative analytical method.
• ESD overcomes limitations of traditional sample preparation in DIOS-MS, improving reliability.
• This approach is effective for the precise quantification of peptides and amino acids.