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One-mode model for patterned metal layers inside integrated color pixels.

Peter B Catrysse1, Wonjoo Suh, Shanhui Fan

  • 1Department of Electrical Engineering, Stanford University, Stanford, California 94305, USA. pcatryss@stanford.edu

Optics Letters
|May 18, 2004
PubMed
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A simplified one-mode waveguide model accurately predicts the optical filter performance in integrated color pixels (ICPs). This analytical model aids in optimizing ICP design for complementary metal-oxide semiconductor image sensors.

Area of Science:

  • Optics and Photonics
  • Materials Science
  • Semiconductor Device Physics

Background:

  • Integrated color pixels (ICPs) are crucial components in modern image sensors.
  • Optimizing ICP optical filters requires accurate analytical models for subwavelength patterned metal layers.

Purpose of the Study:

  • To develop and validate a simplified analytical model for ICP optical filters.
  • To demonstrate the efficacy of a one-mode waveguide model for predicting ICP performance.

Main Methods:

  • Modeling subwavelength gaps in metal layers as single-mode waveguides.
  • Deriving an Airy-like transmittance formula for transverse-electric polarization.
  • Comparing model predictions with 2D finite-difference time-domain (FDTD) simulations.

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Main Results:

  • A one-mode model effectively captures key features of ICP wavelength selectivity.
  • The derived formula predicts an angle-independent cutoff wavelength.
  • Model predictions show good agreement with FDTD simulation results.

Conclusions:

  • A simplified analytical model is sufficient for optimizing ICP optical filters.
  • The one-mode waveguide approach offers a computationally efficient alternative to complex simulations.
  • This work facilitates the design of advanced image sensors.