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Mononuclear precursor for MOCVD of HfO2 thin films
Arne Baunemann1, Reji Thomas, Ralf Becker
1Inorganic Materials Chemistry Group, Lehrstuhl für Anorganische Chemie II, Ruhr-University Bochum, Universitätsstr. 150, D-44780 Bochum, Germany.
Chemical Communications (Cambridge, England)
|July 21, 2004
Abstract:
We report the precursor characteristics of a novel mononuclear mixed alkoxide compound [Hf(O(i)Pr)2(tbaoac)2] and its application towards MOCVD of HfO2 thin films in a production tool CVD reactor.