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The Effect of Interfacial Chemical Bonding in TiO2-SiO2 Composites on Their Photocatalytic NOx Abatement Performance
Published on: July 4, 2017
Precursor chemistry for TiO2: titanium complexes with a mixed nitrogen/oxygen ligand sphere
Arne Baunemann1, Malte Hellwig, Ashish Varade
1Lehrstuhl für Anorganische Chemie II, Universitätsstr. 150, Ruhr-University Bochum, Bochum, 44780, Germany.
New titanium amido-malonato complexes were synthesized for Metal-Organic Chemical Vapor Deposition (MOCVD). The study found that ligand substitution significantly impacts thermal properties, making specific complexes suitable for either classical MOCVD or liquid injection-MOCVD, with one showing promise for TiO2 thin film deposition.
Area of Science:
- Inorganic Chemistry
- Materials Science
- Chemical Engineering
Background:
- Titanium complexes are crucial precursors in materials science.
- Developing novel precursors with tunable properties is essential for advanced deposition techniques.
Purpose of the Study:
- To synthesize and characterize novel mixed amido-malonato titanium complexes.
- To evaluate the suitability of these complexes for Metal-Organic Chemical Vapor Deposition (MOCVD) applications.
Main Methods:
- Synthesis via Brønsted acid/base reactions using titanium amido complexes and malonate ligands.
- Characterization using NMR (1H, 13C), CHN analysis, and mass spectrometry.
- Crystal structure determination for selected complexes.
Main Results:
- Four new titanium amido-malonato complexes were successfully synthesized and characterized.
- Complexes exhibited distinct chemical and thermal properties influenced by malonate ligand substitution.
- Complexes with di-isopropylmalonate (dpml) ligands showed promise for classical MOCVD, while di-tert-butylmalonate (dbml) complexes were suited for liquid injection-MOCVD.
- One complex, [Ti(NEt2)2(dpml)2], demonstrated suitability for TiO2 thin film deposition via MOCVD.
Conclusions:
- Novel titanium amido-malonato complexes offer tunable properties for MOCVD.
- Ligand design is critical for optimizing precursor performance in different MOCVD techniques.
- The synthesized complexes represent promising precursors for depositing TiO2 thin films.
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