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Preparation of Macroporous Epitaxial Quartz Films on Silicon by Chemical Solution Deposition
Published on: December 21, 2015
Deposition of thin mesoporous silica films on glass substrates from basic solution
1Graduate School of Science and Engineering, Waseda University, Nishiwaseda 1-6-1, Shinjuku-ku, Tokyo 169-8050, Japan.
Journal of Colloid and Interface Science
|September 5, 2006
Abstract:
Transparent thin (ca. 100 nm) films of silica-surfactant mesostructured materials were deposited on borosilicate glass plates and soda-lime glass tubes from aqueous solutions containing tetraethoxysilane, alkyltrimethylammonium chloride, ammonia, and methanol. By calcination in air, the films became mesoporous (BET surface area of 700-900 m2 g-1) with pore diameter 2.0-2.8 nm.

