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Updated: Jul 6, 2026

Bringing the Visible Universe into Focus with Robo-AO
Published on: February 12, 2013
At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems
P Naulleau1, K A Goldberg, E M Gullikson
1Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA. pnaulleau@lbl.gov
Abstract:
The extreme-ultraviolet (EUV) phase-shifting point-diffraction interferometer (PS/PDI) has recently been developed to provide high-accuracy wave-front characterization critical to the development of EUV lithography systems. Here we describe an enhanced implementation of the PS/PDI that significantly extends its measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wave front and flare. PS/PDI-based flare characterization of two recently fabricated EUV 10x-reduction lithographic optical systems is presented.
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