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Xenon capillary discharge extreme-ultraviolet source emitting over a large angular range
Applied Optics
|March 25, 2008
Summary
A new capillary discharge source collects extreme-ultraviolet (EUV) radiation without a window. This xenon-based source emits at 11.3 and 13.5 nm, suitable for high-power EUV imaging.
Area of Science:
- Physics
- Optical Engineering
Background:
- Extreme-ultraviolet (EUV) radiation sources are crucial for advanced imaging technologies.
- Conventional EUV sources often require vacuum windows, complicating system design and limiting applications.
Purpose of the Study:
- To present a novel capillary discharge source configuration for EUV radiation.
- To enable efficient collection of EUV radiation at large off-axis angles without a vacuum window.
Main Methods:
- Development of a capillary discharge source.
- Operation using xenon gas.
- Characterization of EUV emission at 11.3 nm and 13.5 nm.
- Integration with a high-collection-efficiency optical system.
Main Results:
- The source successfully generates intense EUV radiation at 11.3 nm and 13.5 nm.
- Radiation collection is achieved at large off-axis angles.
- The need for an EUV-transparent window is eliminated.
Conclusions:
- The described capillary discharge source offers a windowless EUV radiation solution.
- Its high-average-power capability makes it promising for advanced EUV imaging applications.
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