Updated: Jun 20, 2026

Femtosecond Laser Filaments for Use in Sub-Diffraction-Limited Imaging and Remote Sensing
Published on: April 25, 2019
You might also read
Articles linked to this work by shared authors, journal, and citation graph.
Researchers fabricated a 99.5-nm grating pattern using deep-ultraviolet (DUV) lithography and spatial-period division. This advanced technique offers advantages over soft X-rays for sub-100 nm pattern fabrication.
Area of Science:
Background:
Purpose of the Study:
Main Methods:
Main Results:
Conclusions: