Related Experiment Video
Updated: Jun 15, 2026

10:17
20 mJ, 1 ps Yb:YAG Thin-disk Regenerative Amplifier
Published on: July 12, 2017
Semiconductor optical amplifiers grown on a metamorphic substrate for long wavelength applications
1Engineering Physics McMaster University, Hamilton, ON, Canada.
Nanotechnology
|March 9, 2010
Summary
Semiconductor optical amplifiers were grown on InAsP metamorphic substrates, achieving gain beyond 1640 nm. This extends long-wavelength accessibility for optical amplifiers and laser diodes.
Area of Science:
- Materials Science
- Optoelectronics
- Semiconductor Physics
Background:
- Semiconductor optical amplifiers (SOAs) are crucial for optical communication networks.
- Extending the operational wavelength of SOAs to longer wavelengths is a key research area.
- Metamorphic substrates offer a pathway to grow novel semiconductor heterostructures.
Purpose of the Study:
- To develop a semiconductor optical amplifier with extended long-wavelength accessibility.
- To investigate the impact of tensile strain on quantum wells in long-wavelength SOAs.
- To demonstrate the fabrication of a laser diode from the same device structure.
Main Methods:
- Growth of a semiconductor optical amplifier on an Indium Arsenide Phosphide (InAsP) metamorphic substrate.
- Incorporation of quantum wells with significant tensile strain within the amplifier structure.
- Characterization of optical gain at wavelengths exceeding 1640 nm.
- Fabrication of a laser diode utilizing the developed device structure.
Main Results:
- The semiconductor optical amplifier demonstrated optical gain at wavelengths beyond 1640 nm.
- The device successfully operated with large tensile strain in the quantum wells.
- A functional laser diode was fabricated from the same epitaxial structure, confirming device versatility.
Conclusions:
- Growth on InAsP metamorphic substrates effectively extends the accessible wavelength range of semiconductor optical amplifiers.
- Tensile-strained quantum wells are compatible with long-wavelength amplification beyond 1640 nm.
- The developed device structure is suitable for both optical amplification and laser diode applications in extended wavelength regions.
