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Updated: Jun 10, 2026

Growth and Electrostatic/chemical Properties of Metal/LaAlO3/SrTiO3 Heterostructures
Published on: February 8, 2018
Jj Ramsey1, Ernian Pan, Peter W Chung
1College of Engineering, University of Akron, 302 Buchtel Common, Akron, OH, 44325, USA. jjramsey@zips.uakron.edu.
A new model simulates quantum dot (QD) growth by predicting surface strain minima for optimal QD placement. This approach aligns well with experimental silicon-germanium QD growth.
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