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Correlation between substrate preparation technique and scatter observed from optical coatings.

K C Hickman, R Wingler, F L Williams

|September 11, 2010

Summary

Substrate preparation significantly impacts optical coating scatter, with the coating itself often dominating the scatter signature. Lower substrate scatter does not always guarantee lower coating scatter in zirconium oxide films.

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Area of Science:

Materials Science
Optical Engineering
Surface Science

Background:

Optical coatings are crucial for various applications.
Substrate surface quality is known to influence coating performance.
Fused silica is a common substrate material in optics.

Purpose of the Study:

To investigate the effect of different substrate preparation techniques on optical coating scatter.
To determine the relationship between substrate scatter and coating scatter for zirconium oxide thin films.
To identify the dominant source of scatter in coated optics.

Main Methods:

Experimental scatterometry measurements.
Total internal reflection microscopy.
Analysis of conventionally polished, superpolished, and float-polished fused silica substrates.
Deposition and characterization of zirconium oxide thin films.

Main Results:

Coating scatter was found to be the dominant factor in the overall scatter signature of the coated optic.
Substrate preparation techniques demonstrably influence the scatter levels produced in optical coatings.
Substrates exhibiting the lowest scatter did not consistently yield coatings with the lowest scatter.

Conclusions:

The preparation method of fused silica substrates plays a critical role in the scatter performance of zirconium oxide optical coatings.
Scatter from the thin film coating itself is a primary contributor to the overall scatter of the optic.
Optimizing substrate preparation requires careful consideration of its interplay with coating deposition to minimize scatter effectively.